P01400 - SEMI P14 - Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy StdTpc-Leadframes This Practice describes conversions between

This Practice describes conversions between dopant density and resistivity for arsenic-

This Specification focuses on panel (largest external) dimensions (with or without process carrier)

雖然本基準是以評估工具的角度撰寫，但也適用在半導體製造設備的設計與開發時所採用之工具。

originally published in 1996

and so forth) are dealt with by other SEMI Standards

P01400 - SEMI P14 - Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy StdTpc-Leadframes This Practice describes conversions betweenNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This procedure is a graphite furnace atomic absorption analytical method for tin in photoresist. The applicable concentration range is 0. 1 to 1 ppm when the sample is diluted one to ten. The precision was found to be